当前位置:群英聚首 > 论文著作 > 正文
Forward tunneling effect and metal-insulator transition in the BaTiO3 film/Si n-n heterojunction
来源:薛庆忠教授个人网站 发布日期:2010-12-05
作者:Lanzhong Hao, Qingzhong Xue (*), Xili Gao, Qun Li, Qingbin Zheng, and Keyou Yan
关键字:BaTiO3 film/Si heterojunction
论文来源:期刊
具体来源:APPLIED PHYSICS LETTERS 91, 212105, 2007
发表时间:2007年

A n-n heterojunction composed of BaTiO3 film and silicon substrate was fabricated, and it shows good rectifying properties in the temperature range of 80–300 K. The forward tunneling effect in the junction at low temperatures (200 K) is proved by the phenomenon that the current increases abruptly when the forward electrical voltage exceeds a high threshold (12 V). The temperature
dependence of the junction resistance under a high forward field exhibits an electrical field controlled metal-insulator transition. The results were explained by using the band structure of the junction.

Copyright © 2005 Polymer.cn All rights reserved
中国聚合物网 版权所有
经营性网站备案信息

京公网安备11010502032929号

工商备案公示信息

京ICP证050801号

京ICP备12003651号